Film dosimetry for occupant exposure monitoring within Far‐UVC installations

Welch, D., Hashmi, R., Petersen, C., Erde, S., Brenner, D. J., & Nardell, E. (2024). Film dosimetry for occupant exposure monitoring within Far‐UVC installations. Photochemistry and Photobiology. Portico. https://doi.org/10.1111/php.13960
Authors:
David Welch
Raabia Hashmi
Camryn Petersen
Steven M. Erde
David J. Brenner
Edward A. Nardell
Affiliated Authors:
David Welch
Raabia Hashmi
Camryn Petersen
Steven M. Erde
David J. Brenner
Author Keywords:
exposure monitoring
far-uvc
film dosimetry
far‐uvc
Publication Type:
Article
Unique ID:
10.1111/php.13960
PMID:
Publication Date:
Data Source:
OpenAlex

Record Created: